Fitness for 5 genes in Sinorhizobium meliloti 1021

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500 ntSMc02556 and SMc02555 are separated by 158 nucleotidesSMc02555 and SMc02554 overlap by 4 nucleotidesSMc02554 and SMc02553 overlap by 2 nucleotidesSMc02553 and SMc02552 are separated by 186 nucleotides SMc02556: SMc02556 - hypothetical protein, at 1,206,297 to 1,206,566 SMc02556 SMc02555: SMc02555 - signal peptide protein, at 1,206,725 to 1,207,168 SMc02555 SMc02554: SMc02554 - hypothetical protein, at 1,207,165 to 1,207,629 SMc02554 SMc02553: SMc02553 - hypothetical protein, at 1,207,628 to 1,208,458 SMc02553 SMc02552: SMc02552 - hypothetical protein, at 1,208,645 to 1,208,794 SMc02552
Group Condition SMc02556 SMc02555 SMc02554 SMc02553 SMc02552
agar plate interaction Parafilmed volatile agar plate with Trichoderma atroviridae IMI N.D. N.D. +0.1 -0.9 N.D.
stress Nickel (II) chloride 1 mM N.D. N.D. -0.7 -0.1 N.D.
pH LB, pH6 N.D. N.D. -0.4 -0.3 N.D.
carbon source Maltitol (C) N.D. N.D. -0.4 -0.4 N.D.
stress copper (II) chloride 1 mM N.D. N.D. -0.5 -0.3 N.D.
stress 3-octanone 2.655166667 mM N.D. N.D. -0.2 -0.5 N.D.
stress Chloride 200 mM N.D. N.D. -0.4 -0.3 N.D.
carbon source D-Xylose (C) N.D. N.D. -0.2 -0.5 N.D.
agar plate interaction control Parafilmed volatile agar plate with no fungus N.D. N.D. -0.7 +0.3 N.D.
carbon source D-Glucose (C) N.D. N.D. -0.5 +0.3 N.D.
stress 3-octanone 0.456 mM N.D. N.D. +0.4 -0.6 N.D.
agar plate interaction Parafilmed volatile agar plate with Trichoderma atroviridae IMI tmk3mutant N.D. N.D. +0.4 -0.6 N.D.
in planta Plant=None; PlantTreatment=None; Sample=no_plant_control; GrowthSubstrate=agar_0.75vol%; Collection=direct (sample tracking unclear; do not publish) N.D. N.D. +0.4 -0.3 N.D.
stress 3-octanone 0.456 mM N.D. N.D. -0.3 +0.5 N.D.
r2a-hepes control R2A-HEPES control for volatile experiments N.D. N.D. +0.5 -0.2 N.D.
r2a-hepes control R2A-HEPES control for volatile experiments N.D. N.D. +0.6 -0.1 N.D.
stress Cisplatin 0.0005 mg/ml N.D. N.D. +0.0 +0.7 N.D.
stress copper (II) chloride 1 mM N.D. N.D. +0.8 -0.1 N.D.
r2a-hepes control R2A-HEPES control for volatile experiments N.D. N.D. +0.4 +0.4 N.D.
stress Paraquat dichloride 0.2 mg/ml N.D. N.D. +0.4 +0.4 N.D.
stress Paraquat dichloride 0.2 mg/ml N.D. N.D. +0.4 +0.4 N.D.
stress D-Cycloserine 0.05 mg/ml N.D. N.D. +0.7 +0.2 N.D.
stress Cobalt chloride 0.16 mM N.D. N.D. +0.9 +0.1 N.D.
stress Thallium(I) acetate 0.001 mg/ml N.D. N.D. +0.6 +0.4 N.D.
lb LB N.D. N.D. +0.7 +0.5 N.D.
lb LB N.D. N.D. +1.0 +0.2 N.D.
stress Nickel (II) chloride 0.5 mM N.D. N.D. +0.6 +0.6 N.D.
lb LB N.D. N.D. +0.8 +0.5 N.D.
stress Thallium(I) acetate 0.0025 mg/ml N.D. N.D. +0.7 +0.6 N.D.
stress Aluminum chloride N.D. N.D. +1.1 +0.5 N.D.
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