Fitness for 5 genes in Pseudomonas fluorescens FW300-N2E2

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500 ntPf6N2E2_4102 and Pf6N2E2_4103 are separated by 70 nucleotidesPf6N2E2_4103 and Pf6N2E2_4104 overlap by 35 nucleotidesPf6N2E2_4104 and Pf6N2E2_4105 are separated by 10 nucleotidesPf6N2E2_4105 and Pf6N2E2_4106 overlap by 13 nucleotides Pf6N2E2_4102 - hypothetical protein, at 4,782,826 to 4,783,029 _4102 Pf6N2E2_4103 - Cytochrome oxidase biogenesis protein Surf1, facilitates heme A insertion, at 4,783,100 to 4,783,837 _4103 Pf6N2E2_4104 - Probable transmembrane protein, at 4,783,803 to 4,784,396 _4104 Pf6N2E2_4105 - Heme A synthase, cytochrome oxidase biogenesis protein Cox15-CtaA, at 4,784,407 to 4,785,486 _4105 Pf6N2E2_4106 - Cytochrome oxidase biogenesis protein Sco1/SenC/PrrC, putative copper metallochaperone, at 4,785,474 to 4,786,373 _4106
Group Condition Pf6N2E2_4102 Pf6N2E2_4103 Pf6N2E2_4104 Pf6N2E2_4105 Pf6N2E2_4106
carbon source Ying_OrganicAcid7 rep B; time point 3 N.D. -0.8 -1.0 -0.8 -1.1
carbon source Ying_OrganicAcid7 rep A; time point 3 N.D. -0.7 -0.7 -0.8 -1.1
carbon source Ying_OrganicAcid7 rep C; time point 3 N.D. -0.4 -0.7 -0.9 -1.0
resistance 50% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine N.D. -0.5 -0.5 -0.5 -0.5
stress DEANONOate 0.000625 M N.D. -1.1 -0.5 -0.3 -0.1
resistance 50% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine N.D. -0.2 -0.5 -0.6 -0.6
resistance 10% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine N.D. -0.5 -0.3 -0.5 -0.6
resistance 10% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine N.D. -0.7 -0.3 -0.5 -0.3
carbon source Ying_OrganicAcid7 rep A; time point 2 N.D. -0.3 +0.1 -0.8 -0.7
carbon source Ying_sugar7 rep B; time point 1 N.D. -0.1 -0.3 -0.7 -0.3
stress DEANONOate 0.000625 M N.D. -0.9 -0.7 -0.1 +0.2
carbon source Ying_AminoAcid20 rep C; time point 2 N.D. -0.4 -0.1 -0.7 -0.2
resistance 10% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine N.D. -0.4 -0.2 -0.4 -0.3
resistance 50% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine N.D. -0.4 -0.2 -0.3 -0.3
resistance 20 mM putrescine N.D. -0.4 -0.0 -0.5 -0.2
carbon source Ying_AminoAcid20 rep B; time point 2 N.D. -0.3 -0.1 -0.7 -0.1
carbon source Ying_Others16 rep C; time point 1 N.D. -0.1 -0.1 -0.5 -0.5
stress dimethyl sulfone 0.25 M N.D. -0.5 -0.2 -0.2 -0.3
carbon source Ying_Others16 rep A; time point 1 N.D. -0.2 +0.0 -0.7 -0.2
carbon source Ying_sugar7 rep C; time point 1 N.D. -0.2 +0.2 -0.5 -0.3
carbon source Ying_Others16 rep A; time point 2 N.D. -0.2 +0.4 -0.5 -0.4
stress 4-Hydroxyacetophenone 0.00025 M N.D. -0.6 -0.4 +0.3 +0.0
stress 4-Hydroxyacetophenone 0.00025 M N.D. -0.5 -0.3 +0.5 +0.0
nitrogen source nitrogen source nitrite 1mM N.D. +0.6 -0.3 -0.0 -0.4
carbon source Ying_all64 rep C; time point 3 N.D. +0.3 +0.2 -0.1 -0.5
carbon source Ying_AminoAcid20 rep C; time point 3 N.D. +0.4 +0.2 +0.2 -0.6
carbon source Ying_Nucleobase14 rep C; time point 3 N.D. +0.4 +0.4 +0.2 -0.3
carbon source Ying_Nucleobase14 rep B; time point 3 N.D. +0.5 +0.4 +0.3 -0.4
stress Hydroxylamine 0.5 M N.D. +0.5 +0.4 +0.2 -0.2
carbon source D-Alanine (C) N.D. +0.4 +0.6 +0.6 +0.3
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