Fitness for 5 genes in Pseudomonas fluorescens FW300-N2C3

Top 30 experiments (either direction), sorted by average fitness

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Group	Condition	AO356_12800	AO356_12805	AO356_12810	AO356_12815	AO356_12820
stress	Sisomicin 0.001 mg/ml	-0.4	-0.6	-0.1	-0.3	-0.2
carbon source	D-Lactate (C)	-0.6	+0.1	-0.4	-0.2	-0.0
carbon source	acetate (C)	+0.1	+0.1	-0.3	-0.0	-1.0
stress	Benzalkonium Chloride 0.016 mg/ml	-1.0	-0.1	+0.2	-0.0	+0.1
survival	4C survival; 1152 hrs	-0.0	-0.2	-0.0	+0.2	-0.8
carbon source	L-Histidine (C)	-0.6	+0.0	+0.2	+0.1	-0.6
resistance	50% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine	-0.8	-0.2	+0.7	+0.1	-0.6
phage	P5ss-5 phage 10-1 dilution SM calcl2	-1.3	-0.1	+0.5	+0.4	-0.2
carbon source	D-Lactate (C)	-0.6	+0.1	-0.5	-0.1	+0.3
motility	outer cut, LB soft agar motility assay	-0.0	+0.2	+0.2	-0.0	-0.9
stress	1-ethyl-3-methylimidazolium lysine 10 mM	-0.6	-0.2	+0.7	+0.1	-0.5
resistance	10% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine	-0.4	-0.1	+0.5	+0.0	-0.3
survival	4C survival; 360 hrs	-0.4	+0.1	+0.3	+0.2	-0.5
anaerobic	Nitrate reduction with yeast extract	-0.1	+0.2	+0.7	-0.0	-0.9
resistance	20 mM putrescine	-0.4	-0.2	+0.6	+0.2	-0.3
stress	Lomefloxacin 0.0005 mM	-0.5	-0.2	-0.1	-0.1	+0.7
nitrogen source	L-tyrosine (N)	-0.8	-0.0	+0.2	+0.2	+0.3
stress	Chlorite 0.08 mM	-0.2	-0.5	+0.7	+0.0	-0.1
resistance	10% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine	-0.4	-0.1	+0.7	+0.3	-0.5
carbon source	Ethanol (C)	+0.4	-0.2	-0.4	-0.1	+0.6
stress	Choline chloride 300 mM	-0.3	-0.2	+0.6	+0.0	+0.2
stress	Choline chloride 500 mM	-0.5	-0.3	+0.8	-0.1	+0.5
resistance	50% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine	-0.7	-0.2	+1.2	+0.3	-0.0
resistance	10% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine	-0.3	+0.0	+0.8	+0.3	-0.2
stress	1-ethyl-3-methylimidazolium chloride 200 mM	+0.2	-0.3	+0.9	-0.1	+0.1
carbon source	L-Lysine (C)	+0.0	-0.4	+0.6	+0.0	+0.7
carbon source	L-Lysine (C)	+0.1	-0.2	+0.6	-0.0	+0.6
carbon source	NAG (C)	+0.7	-0.1	+0.5	+0.1	+0.1
resistance	50% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine	-0.4	-0.3	+1.6	+0.4	+0.1
carbon source	D-Xylose (C)	+0.1	+0.1	+0.7	+0.2	+0.3