Fitness for 5 genes in Pseudomonas fluorescens FW300-N2C3

Top 30 experiments (either direction), sorted by average fitness

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Group	Condition	AO356_05735	AO356_05740	AO356_05745	AO356_05750	AO356_05755
anaerobic	Nitrate reduction with yeast extract	+1.6	-0.1	-0.9	-0.8	-3.6
carbon source	D-Fructose (C)	-1.4	-0.0	-0.2	-0.4	-0.7
carbon source	D-Mannose (C)	-2.2	-0.3	-0.3	+0.1	+0.1
stress	Nickel (II) chloride 0.625 mM	-0.7	-0.2	+0.1	-0.7	-1.1
motility	outer cut, LB soft agar motility assay	-2.1	-0.2	-0.1	-1.0	+0.8
survival	4C survival; 1152 hrs	-1.7	+0.0	+0.5	-0.3	-0.7
carbon source	L-Histidine (C)	-1.9	+0.0	+0.1	+0.0	-0.2
stress	Benzalkonium Chloride 0.008 mg/ml	-1.3	+0.1	-0.4	-0.1	-0.3
stress	KB-half, Pseudo11 supernatant, 100 uM FeCl3	-0.4	-0.1	+0.3	-0.7	-1.0
stress	Vanillin 2.5 mM	-1.4	-0.2	-0.4	+0.0	+0.1
carbon source	D-Galactose (C)	-1.5	-0.1	+0.5	-0.2	-0.5
stress	methylglyoxal 0.016 vol%	-0.0	-0.1	+0.2	-0.9	-0.9
motility	outer cut, LB soft agar motility assay	-1.6	-0.0	+0.2	-0.3	+0.2
stress	Choline chloride 300 mM	-1.1	-0.1	-0.2	-0.5	+0.5
stress	Nickel (II) chloride 0.625 mM	-0.9	-0.1	+0.6	-0.5	-0.4
temperature	LB 37C	-1.1	+0.1	+0.4	-0.4	-0.2
stress	KB-half, Pseudo5 supernatant	-1.2	+0.1	+0.3	+0.3	-0.5
phage	P5ss-5 phage 10-1 dilution SM calcl2	+0.5	-0.0	-0.5	-1.1	+0.2
stress	perchlorate 75 mM	+0.8	-0.2	-0.6	-0.5	+0.1
carbon source	Carbon source Sucrose 5 mM	-1.5	+0.1	+0.3	+0.5	+0.7
carbon source	D-Glucose (C)	+0.5	+0.0	+0.6	+0.1	-1.0
stress	copper (II) chloride 2.5 mM	-1.0	+0.4	-0.3	+0.5	+1.0
motility	outer cut, LB soft agar motility assay	+1.1	-0.0	+0.2	-0.7	+0.3
resistance	10% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine	+2.6	-0.1	-0.3	-0.2	-0.3
resistance	10% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine	+2.9	-0.1	-0.7	+0.0	-0.2
resistance	20 mM putrescine	+2.8	+0.1	-0.1	-0.4	-0.3
resistance	50% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine	+2.8	+0.2	-0.3	-0.7	+0.2
resistance	50% P. fluorescens FW300-N2C3 spent media from growth in 20 mM putrescine	+3.1	-0.1	+0.1	-0.7	+0.0
resistance	10% P. fluorescens FW300-N1B4 spent media from growth in 20 mM putrescine	+3.1	-0.1	-0.2	-0.1	-0.2
resistance	50% P. fluorescens FW300-N2E2 spent media from growth in 20 mM putrescine	+2.6	-0.1	+0.0	-0.0	+0.2